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Used Semiconductor Equipment, Vacuum Systems, Pumps, Etc: fl01

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8 Inch Semiconductor Equipment: fl17

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Parts for Novellus, Concept One & Two, Wafer Fab Equipment, fl20

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Six Inch (6 Inch) Semiconductor or Wafer Fab Equipment Package, Etc. fl27

Semiconductor Equipment: Ion Implanters, Furnaces, Resistivity Meter, Etc. fl28

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Semiconductor Vacuum Systems, Six Inch (6") Wafer Fab Equipment, Measurement Systems for Semiconductor Manufacturing

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Contents


Six Inch (6") Wafer Fab or Semiconductor Equipment

Item Vendor Model Process Type Vintage
1 NISSIN NH-20SR Mid-Current Ion Implanter 1/1/1992
2 NISSIN NH-20SR Mid-Current Ion Implanter 1/1/1993
3 MACTRONLY FV-6 TYPE T-BAWL 1/1/1993
4 TEL VCF-615S FURNACE Anneal (Pre N+, ILD Density, Poly) 1/1/1992
5 TEL VCF-615S FURNACE LPCVD Nitride 1/1/1992
6 TEL VCF-615S FURNACE (POLY) 1/1/1992
7 TEL VCF-615S FURNACE (POLY) 1/1/1992
8 Therma Wave TP-300 Dose Measurement 1/1/1992
9 AG AG 8108 RTA 1/1/1993
10 DNS WSW625 SC-1 Clean (Metal) 1/1/1993
11 DNS WSW625 SC-1 Clean (Metal) 1/1/1992
12 EATON NV-GSD-100 HI-Current Ion Implanter 1/1/1994
13 TEL TEL-615 Pyro-Ox
14 TEL TEL-615 TEOS
15 TEL TEL-615 D-POLY
16 TEL TEL-615 Pyro-Ox
17 TEL TEL-615 Nitride-1
18 TEL TEL-615 Poly
19 KOYO VF-4000 PIX Cure 1/1/92
20 TEL TE-5000 CT, VI Etch
21 TEL TE-5000 CT, VI Etch
22 TEL TE-8500 Nitride-l Etch
23 TEL TE-580L PA Etch 1/1/92
24 Plasma System Corporation DES212-304 AVL Asher 1/1/92
25 MARUWA HOOD ACT Clean 1/1/92
26 AMAT P5000 Trench Etch 7/1/94
27 TEL TEL-580LC PA Etch 1/1/92
28 TEL TEL-8500 Nitride-l Etch 1/1/94
29 LAM LAM 4520 S/W Oxide Etch ILD SOG/SOG Etch Back 1/1/95
30 TEL TEL-580L PA Etch 1/1/92
31 AMAT P5000 Metal Etch 1/1/93
32 Plasma System Corporation PBM-6200 OVEN 1/1/92
33 TEL TE-5000
34 LAM LAM 4420 1/1/92
35 TEL Mark II Coater 1/1/1993
36 TEL PIX Developer Coater 1/1/1993
37 KLA KLA-5000 Overlay Inspection 1/1/1994
38 DNS VLM6000-LS Film Thickness Measuring 1/1/1992
39 NANOMETRICS 216S-052 FILM THICKNESS/REFLECT 4/1/1995
40 Hitachi S-6200 Critical Dimension 1/1/1993
41 Koyo Lindberg VF-4000 I/II PIX Cure 1/1/1992
42 Koyo Lindberg VF-4000 I/II PIX Cure 1/1/1992
43 TEL Mark II Coater 1/1/1992
44 TEL Mark II Coater 1/1/1993
45 TEL Mark II Developer 1/1/1993
46 TEL Mark II Developer 1/1/1993
47 KLA KLA-2111B Wafer Defect Inspection System 7/1/1994
48 KLA KLA 2551 Analysis Station 1/1/1994
49 DNS SDM-603-PLS Trench Measuring System 1/1/1992
50 AMAT P-5000 PA OX CVD 1/1/1993
51 AMAT P-5000 PA NIT CVD 1/1/1992
52 CANON APT-4800 ATMOSPHERIC TEOX-OZONE CVD SYSTEM 1/1/1993
53 DNS SC-W80A-AVG SOG Coater
54 DNS SCW-623-AV SOG Coater 1/1/92
55 AMAT P-5000 IMD PE TEOS CVD 1/1/1992
56 AMAT P-5000 IMD PE TEOS CVD 1/1/1992
57 AMAT P-5000 IMD PE TEOS CVD 7/1/1994
58 AMAT P-5000 WCVD 1/1/1994
59 DNS SSW629-B Single Side Scrubber 1/1/1992
60 DNS SSW629-B Single Side Scrubber 1/1/1992
61 DNS SSW629-B Single Side Scrubber 1/1/1992
62 DNS SSW629-B Single Side Scrubber 1/1/1992
63 DNS SSW629-B Single Side Scrubber 1/1/1992
64 HEWLETT-PACKARD ASIA PACIFIC LIMITED 4062 TSK AUTO PROBING-RT103 1/1/1992

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Note: All Products: Subject to availability at time and date of inquiry.

Contents


Used Kokusai Vertical Furnace System

Item Equipment/Description Model/Serial No. Manufacturer Comments
1 Kokusai Vertical Furnace System, 8 Inch Vertron DJ-803V Kokusai Used for Nitride, Poly, and Teos processes. One large crate of spare parts is available. To be sold "As-Is", "Where-Is".

Submit reasonable offers for immediate consideration.

Please click on the stamp images below to see photos:

Nitride Front PhotoPoly Front PhotoTeos Front PhotoWafer Handler Photo

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Note: All Products: Subject to availability at time and date of inquiry.

Contents


Used Vertical Furnace, TEL LPCVD System

Item Equipment/Description Model/Serial No. Manufacturer Comments
1 Vertical Furnace, LPCVD System, 6 and 8 Inches Alpa 8SE-C, M00009860061 TEL Used for Poly deposition process. One and a half year usage. Supplied by Tokyo Electron Ltd. Equipment is in crate. Some spare parts included.

Please click on the stamp images below to see photos:

TEL LPCVD Photo1 TEL LPCVD Photo2

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Note: All Products: Subject to availability at time and date of inquiry.

Contents


Surplus Semiconductor Equipment

Surplus or Excess Semiconductor Equipment