Surplus Semiconductor Equipment: Novellus Concept One, Lam 4520i, Varian 3290, Applied Materials Centura HP PVD, Sputtered Films Inc 8600, Axcelis-Eaton GSD-200E & GSD-200EE, Etc.
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Novellus Concept One, Lam 4520i, KLA-Tencor Surfscan SP1, Axcelis-Eaton Ion Implanters GSD-200E and GSD-200EE, Varian 3190 Configurations and Equipment List
Please click on the links below to explore Systems configurations and other equipment for sale.
- Five Inch Fab for Sale
- Five Inch Semiconductor Equipment for Sale
- Novellus, Concept One, #734 System
- Novellus, Concept One, #770 System
- Novellus, Concept One, #852 System
- Lam 4520i, ER
- KLA-Tencor Surfscan, Model SP1, ER
- Axcelis-Eaton, GSD-200EE, ER
- Axcelis-Eaton, GSD-200E, MS
- Varian Sputtering System, 5 Inch 3190
- Significant Parts for Semiconductor Equipment
- Significant Parts for Semiconductor Equipment #2
To see photos or pictures of other equipment and parts, please click here.
Contents
- GSD200E Upgraded to GSD200EE
- KLA-Tencor Surfscan SP1
Non-Patterned Wafer Particle Measurement System
- Film Thickness Mapping System, Prometrix FT-650
- Oxide Etcher, Lam 4520i, 6 Inch or 150MM
- Novellus Sputter Deposition, Model 3290-STQ, 6 Inch
- Applied Materials Centura HP PVD, 6 Inch
- Sputtered Films, Inc. Model 8600, 6 Inch
- 8 Inch Kokusai Vertical Furnace
- Surplus Semiconductor Equipment
- Eaton Nova Ion Implanter, NV10-160, 4 Inch
- Eaton/Axcelis GSD-200, 8 Inch, High Current Ion Implant System
- Eaton/Axcelis GSD-200E, 5 Inch with 6 Inch Kit
- Eaton NV8250P, 6 Inch, Medium Current Ion Implanter
- Varian Ion Implanter, 8 Inch, High Energy Ion Implantation System
Details and Configuration
- End station Generic Extended Yscan GSD200
- 4 Light Tower w/ Flasher
- Obs E63332 Rpl By 10011280 Spc Option w/o 8mm Tape
- Standard White Inner Enclosure
- Hyt 20sx 200mm Wide Access
- English Domestic, Asia Pacific Labels
- Cga 330 1/4" M Vcr W/M Nut
- Cga 580 1/4" M Vcr W/M Nut
- Auxiliary Gas Bottle
- Cassette Guide Flurouware Ka200-80mhr
- GSD200E Unique Assy's 80kv
- 50 ft Remote On Board w/ Fast Regen
- Retrofit Rotary Drive (Direct)
- Retrofit Transformer Thermal Warning
- 200mm Load Buffer for Bar Code
- 3 Bot Sds Modular
- Plasma Shwr Gsd-200e 80kv/160kv W 2000 Hr Cons
- Argon Purge Mod Gas Box (W/4x)
- Rga Kf-40 No Valve P9 Blankoff
- Ina 15357 Field Rpl Only (Sys Cons 200hr (Mo)
- P2 & P3 Relief Valve Exhaust SS Lines
- Dis 63926 Fro Exhaust Switching
- End Station Flow Monitor
- Dis 58900 Fro Sprs Strk Plt Disk Fara (1199240)
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Details
- ID: ER1483
- Serial Number: 0697-130
- Configurable for 150mm-200mm Wafer Sizes
- Original Manufacture Date: June 1997
- Model Number: 378534
- System is in excellent condition and has seen little use
- Normal Illumination - Defect Sensitivity: 0.079um
- Haze Sensitivity: 0.005PPM
- Argon Ion Laser (488-nm)
- Equipe Robot: ESC 200
- RTDC (Real TimeDefect Classification)
- V 208, A 30, Ph 1, HZ 60
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Details
- ID: ER266
- Serial Number: 9008F2U
- Measures Single or Multiple Layers of Oxide, Nitride, Photo Resist, Poly Silicon and other Transparent Films from <100A to >4um
- Patterned Recognition Capability for Fully Automatic Operation
- Removed from Service April 2001
- Currently stored in Clean Show Room
- Power Requirements: 115 VAC, 500 Watts, 50/60 Hz
- Configured for 150mm Wafers
- Olympus Objectives
- MS PLAN 2.5X/0.07
- MS PLAN 5X/0.13
- MS PLAN 10X/0.30
- MS PLAN 20X/0.46
- MS PLAN 50X/0.55
- Cognex Vision System
- 3100 Controller
- Video Switch
- C2CFT Wafer Loa
- Cable Interface w/ Cables
- AST Premium 386/25
- Dimensions: 36"D x 62"W x 62"H
- Weight: 700 lbs
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Details
- ID: ER1450
- Serial Number: 2653
- Configured for 150mm Wafers
- Through-the-Wall Configuration
- Isotropic Etch Module
- Hine 38A Indexers
- Top Actuated Bottom Clamp
- High Conductance Manifold
- Erotherm Temperature Controller
- Low Frequency Auto tuning (LoFat)
- Remote RF Cart
- ENI OEM LPG 12A RF Generator
- ENI OEM 12XLA RF Generator
- 3 Verity EP 200MMD Monochromator
- Backside Helium Cooling
- Lam Dual Channel Chiller
- Orbitally Welded Gas Box
- Unit 1660 MFC CF4 200 Sccm
- Unit 1200A MFC O2 30 Sccm
- Unit 1200A MFC SF6 100 Sccm
- Unit 1200A MFC Ar 1000 Sccm
- Unit 1200A MFC CHF3 50 Sccm
- Unit 1200A MFC N2 100 Sccm
- Unit 1200A MFC NF3 1000 Sccm
- Unit 1200A MFC He 500 Sccm
- Remote AC Box
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Details and Configuration:
Quantity: 2
Excellent Condition
Serial No. LVE80511, Date Installed: June, 2000
Serial No. LVE80512, Date Installed: June, 2000
- Model 3290-STQ Fully automatic, cassette-to-cassette wafer loading and unloading:
- Quantum Sputter Deposition Sources for each Deposition Station including:
- 1. (1) Quantum Sputtering Source
- 2. (1) CMD GEN 2.5-12KW-DC power supply per source including:
- a. Remote digital power supply readout meters
- b. Conveniently installed in system control electronics rack
- c. One set of 50 ft. cables for each Quantum Source
- 586 System Controller Including:
- 1. 14" VGA colog touch screen via surface acoustic technology
- 2. 238 Meg Hard Drive
- 3. Interface Keyboard, Track Ball
- 4. Printer Port
- 5. Graphic User Interface
- 6. Recipe Controlled Heaters
- 7. Cryo Pump Quick Regeration Capability
- 8. On-screen Data Collection and History Log
- 9. User definable system access levels and access codes
- 10. Diagnostic routines for maintenance and troubleshooting
- 11. Programmable cool-time prior to wafer unload
- CTI Onboard Cryo Pump with Fast Regeneration capability
- Dedicated Load Lock Turbo Pump
- (2) Edwards ESDP 30 Mechanical Roughing Pumps
- Proximity Switches for Load Lock and Sealed Doors
- Particle Reduction Kit
- Electropolished Argon Develivery System
- Argon Line Isolation Valve
- AC Power Line Filter
- 15 Minute UPS
- (2) Sets of Quick Change Shields
- Quantum Targets
- RF Etch with Preheat at Station 1
- CTI Water Pump
- VIP at Station 1
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Details and Configuration:
Quantity: 1
Escellent Condition
Serial No. T-27094-33-2519, (System 2519)
Date Installed: May 2001
Applied Materials Cuntura HP PVD, 6", mainframe with:
- One ultra-high vacuum Centura HP PVD platform featuring the HP dual high speed wafer transfer robotics, dual load lock chambers, a Fast Regen Cryo pump, and wafer mapping cassette capability.
- The Centura HP PVD control system features a 32-bit microprocessor control, CRT display with light pen. Software capability includes sophisticated recipe programming, process parameter and wafer history storage, self diagnostics, automated service routines, and host computer interface via an RS232 port.
Chambers A, B, & D - Aluminum PVD (Aluminum Dura Source Process)
- PVD Chamber Opt.: Std. PVD Chamber
- PVD UHV Pump Opt.: CTI Fast Regen Low Vibration
- PVD Power Supply Opt.: High Accuracy Low Output (HALO)
- PVD Wafer Chuck Opt.: Mechanically Clamped Heaters
- Mechanical Clamped: Clamped "Original" Heater
- Clamp Ring Opt.: SST ARC Sprayed Clamp Rings
- Shield Opt.: SST One Piece Arc Sprayed
- PVD Pressure Control:
- Gate Valve: 2-Position Gate Valve
- Cryo Restrictors: Standard Cryo Restrictor
Chamber C - Aluminum PVD (Aluminum Dura Source Process)
- Same as above except:
- Clamp Ring Opt.: Ti Arc Sprayed Clamp Ring
Chamber F - Auxiliary Chamber
- Orienter Chamber Opt.: Orienter with Std. Degas
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Details and Configuration:
Quantity: 2
Escellent Condition
Serial No. 19347
Date Installed: January, 1997
- Software rev. 2.0
- Backing pumps for all modules are Vacuubrand MD-4l
- TM uses CTI 8510 Cryo compressor
- PM1 and PM3
- Sputter module
- Series 4.2 Gun
- UPS
- Omega CN3000 Controller
- AE RFX-600 RF Generator
- AE ATX-600 RF Tuner
- AE MDX-1.5K Magnetron Drive
- AE MDX-1.5K Magnetron Drive
- HP 6012B DC Power Supply
- Pfeiffer TPH180HU Turbo
- PM2 and PM4
- Sputter module
- Series 4.2 Gun
- UPS
- AE RFX-600 RF Generator
- AE ATX-600 RF Tuner
- AE MDX Pinnacle 6
- AD MDX Pinnacle 6
- HP 6012B DC Power Supply
- Inficon Transpector RGA Head
- Pfeiffer TPH180HU Turbo
- PM5
- Degas, RF etch module
- Series 3 Gun
- UPS
- AE RFX-600 RF Generator
- AE ATX-600 RF Tuner
- AE MDX Pinnacle 6
- HP 6012B DC Power Supply
- Inficon Transpector RGA Head
- Pfeiffer TPH180HU Turbo
- CM
- Cassette module
- Omega CN132 Controller
- UPS
- Pfeiffer TPH180HU Turbo
- TM
- Transfer module
- Inficon Transpector RGA Head
- CTI-Cryogenics water pump
- Pfeiffer TPH180HU Turbo
- Software rev. 2.0
- Backing pumps for all modules are Vacuubrand MD-4l
- TM and PM3 share a CTI 9600 Cryo compressor
- PM1
- Degas, RF etch module
- Series 3 Gun
- UPS
- AE RFX-600 RF Generator
- AE ATX-600 RF Tuner
- AE MDX Pinnacle 6
- HP 6012B DC Power Supply
- Pfeiffer TPH180HU Turbo
- PM2
- Sputter module
- Series 4.2 Gun
- UPS
- Omega CN3000 Controller
- AE RFX-600 RF Generator
- AE ATX-600 RF Tuner
- AE PE-10K AC Plasma Source
- AE PE Power Pack
- Pfeiffer TPH180HU Turbo
- PM3
- Sputter module
- Series 4 Gun
- UPS
- CTI Cryogenics Water Pump
- Omega CN3000 Controller
- AE RFX-600 RF Generator
- AE ATX-600 RF Tuner
- AE MDX-L12M
- AE MDX-L12M
- HP 6012B DC Power Supply
- Inficon Transpector RGA Head
- Pfeiffer TPH180HU Turbo
- PM4
- Sputter module
- Series 4.2 Gun
- UPS
- Omega CN3000 Controller
- AE MDX Pinnacle 6
- AD MDX Pinnacle 6
- Pfeiffer TPH180HU Turbo
- PM5
- Sputter module
- Series 4.2 Gun
- UPS
- RGA Computer
- AE MDX Pinnacle 6
- AD MDX Pinnacle 6
- Pfeiffer TPH180HU Turbo
- CM
- Cassette module
- Omega CN132 Controller
- UPS
- Pfeiffer TPH180HU Turbo
- TM
- Transfer module
- Inficon Transpector RGA Head
- CTI-Cryogenics Water Pump
- Pfeiffer TPH180HU Turbo
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Note: All equipment are subject to availability at time and date of inquiry
Contents
Used, Surplus, or Pre-owned Semiconductor Equipment for Sale
Please call or send inquiry to info@semiconweb.net.
If interested in one or more items, you may also click here.
Note: All products are subject to availability at time and date of inquiry.
Note 2: All Applied Materials, P-5000's are 8 inch systems.
| Item
| SRMM ID Code
| Manufacturer
| Model
| S/N
| Description
| Wafer Size, mm
| Configurations/Comments
|
| 1
| SR-8005T
| Applied Material
| P5000
| 7052
| Mark II MxP Etcher, Poly, 3 chamber
| 200
| Mainframe 5000 MxP-OIE, 3 chambers: A-Polysilicon MxP2000A, B-Dielectric P1000B, C-Polysilicon MxP 2000C, Cassette Loader, Gas Panel, 5000 Standard Interface, Edwards Pumps, RF, (NF3, Ar, CF4, N2, Hydrogen Bromide Chloride).
|
| 2
| SR-8010T
| Applied Material
| P5000
| 7019
| Mark II MxP Etcher, Dielectric, 4 chamber
| 200
| Mainframe 5000, MxP-OIE, 4 chamber A-D Dielectric Etch MxP 2000A, 1000B, 1000C, 1000D (4 Etch Chambers) w/ Leybold Wet Pump, Gas Panel, Cassette Loader, RF, (He, Freon, N2, O2/He, Ar, Ethylene Glycol).
|
| 3
| SR-8006T
| Applied Material
| P5000
| 7035
| Mark II MxP Etcher, 3 chamber
| 200
| Mainframe 5000 MxP-OIE, 3 chambers: A-Dielectric MxP 1000, B-MxP 1000B, C-MxP 1000C, Includes Gas Panel, 5000 Standard Interface, Edwards Pumps, RF, (O2, Ar, He, H2).
|
| 4
| SR-8008T
| Applied Material
| P5000
| 4503
| Mark II MxP Etcher, Poly, 4 chamber
| 200
| Mainframe, Taper via Etch Tool, 4 Chambers: A-D Dielectric Etch MxP 1000A, B, C, & D, Gas Panel (4 Etch Chambers) w/ Transfer Chamber, RF, (Ar, He, NF3, N2, Freon).
|
| 5
| SR-8009T
| Applied Material
| P5000
| 7039
| Mark II MxP Etcher, Metal, 4 chamber
| 200
| 4 Chambers: A-D w/ Gas Panel (4 Etch w/ Transfer Chamber), RF, (N2, Ethylene Glycol, He, Freon, O2, Argon, Carbon Tetraflouride).
|
| 6
| SR-8007T
| Applied Material
| P5000
| 6911
| Mark II MxP Etcher, 2 chamber
| 200
| 500 MxP-OIE, A: Polysilicon MxP 2000A, Chamber B: Dielectric MxP 1000B w/ Gas Panel, Cassette Loader, RF, (O2, He, CL, Nitrogen Triflouride, Hydrogen Bromide, HBr, He, Freon, Argon, N2).
|
| 7
| SR-8011T
| Applied Material
| P5000
| 7038
| Mark II MxP Etcher, 4 chamber
| 200
| System 5000 MxP, w/ Mainframe 5000, MxP-OIE, Chamber A-D Dielectric Etch MxP 2000A, 1000B, 1000C, 1000D (4 Poly Etch Chambers) w/ Leybold Pump, Gas Panel, RF, (NF3, N Bromide, Cl, B, Ethylene Glycol, He, O2, Freon, SF6)
|
| 8
| SR-8001T
| Atomika Inst
| SIMS
| |
SIMS
| N/App.
| 3 Ion Guns: Cs, O2, Ga
|
| 9
| SR-8002T
| Atomika Inst
| TXRF 8030W
| |
TXRF
| 125-200
| Optional Iwatani Liquid Nitrogen Generator
|
| 10
| SR-10056T
| Advantest
| T3323
| |
N/A
| 125-200
| |
| 11
| SR-10041T
| Delta Design
| 9023
| 23 53 4
| Temperature Chamber
| N/A
| Includes cooling hoses & manual
|
| 12
| SR-10046T
| DNS
| WS620C Spin Module
| New
| Module for WS620C
| 150
| New, Never Installed
|
| Item
| Equipment/Description
| Model/Serial No.
| Manufacturer
| Comments
|
| 1
| Kokusai Vertical Furnace System, 8 Inch
| Vertron DJ-803V
| Kokusai
| Used for Nitride, Poly, and Teos processes. One large crate of spare parts is available. To be sold "As-Is", "Where-Is".
|
Submit reasonable offers for immediate consideration.
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Note: All Products: Subject to availability at time and date of inquiry.
Contents
Surplus or Excess Semiconductor Equipment
- 1 Ea - Dynatech Laboratories Immunoassay System with Microplate Reader, and Incubator Stacker
- Hitachi Model S-570 Scanning Electron Microscope
- Model Access 60 75 W CO2 /5 mW HeNe Laser
- Instrumentation Laboratories Model 661-10 Chemistry Analyzer
- Lumiscan Model 150 Lumiscan
- Perking-Elmer Model Lambda 31 UV/VIS Spectrophotometer
- Spectra-Physica Model 270 Laser Exciter
- Spectra-Physics Model SP4270 Integrator
- Tektronix Model 1480R WaveForm Monitor
- Tektronix Model 528 WaveForm Monitor
- Tektronix Model 1420 NTSC VectroScope
- UniLase Code # 2100 CO2 Laser
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Note: All equipment are subject to availability at time and date of inquiry
Contents
| Item
| Equipment/Description
| Model/Vintage
| Manufacturer
| Comments
|
| 1
| High Current Ion Implanter
| NV-10-160, 1993
| EATON
| Configured for 4 inch wafers. Very good working condition. Equiped with automatic loading system -AT-4. Purchased new in 1993, installed in 1994 by EATON's technical group.
|
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Note: All Products: Subject to availability at time and date of inquiry.
Contents
Details
- Serial Number: 0800315
- SDS capable for 2 gases or VAC capable for 1 gas
- Ebara Dry Pumps
- CTI Cryo Pumps
- Leybold TMP1000 Turbo Pump
- HYT Particle Monitor
- RGA Port
- Bar Code Reader
- Modem
- Remote Sun Workstation
- Printer
- Disk Cart
- Electron Shower
- Lead Floor
- Spare Source Liner
- Spare Electron Gun
- Spare Manipulator
Reference: ms700k2810772
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Note: All Products: Subject to availability at time and date of inquiry.
Contents
Configuration
- Configured for 200 mm wafers
- Manufactured Date: May, 1996
- CE Marked System
- Interface:
- Sun Spac V computer
- MTI floppy and backup drive
- Sun service monitor
- Software version 4.4.2.1
- SECS I/O interface
- Programmable tilt angle: -10 to +10
- Dose range: 1.0 E11 to 1.0 E17 ions/cm squared
- Energy range: 10 to 180 keV
- ASYST wafer handler
- 4 cassette stages
- Extra sources: Enhanced without vaporizer
- Macrobot, s/n 95497
- Oil-filled transformer
- Auxiliary equipment:
- Chiller: Neslab, s/n C95128144
- Pumps:
- Ebara 40x20 tur backup, s/n 956274
- Ebara 40x20 end station pump, s/n 156270
- Seiko H2000C turbo, s/n 0274R
- CTI CT8 beamline, s/n 32C8916481
- CTI CT10 end station, s/n 1389406376
- Cryo compressors:
- CTI 8300, s/n 85C0006349
- CTI 8500, s/n 68B9608751
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Note: Subject to availability at time and date of inquiry.
Contents
Vital Information and Configuration:
- Purchased 10/25/1998
- Configured for 6 inch wafers
- Sun Sparc 5 Operating System
- Software version 3.5.2i
- 8 mm tape backup
- Extended life source (VLS)
- Remote monitor
- Miscellaneous parts of $100,000 spare parts kit remaining
- 2 extra sources, approx $40,000 each
- Seiko-Seiki turbos:
- 2 with STP 100C controller
- 1 STP 300C
- Up to 750 keV with triple charge
- 4x SDS gas box (subatmospheric delivery system)
- Edwards DP40 W/ 350 blower for end station/load lock
- 3 CTA on-board cryos
- 2 Edwards DP40's for chamber
- Neslab chiller
- ESC chuck
- Power conditioning/isolation transformer
- Front End:
- 3 load cassettes
- Flat finder
- Buffer cassette
- Macrobot robot (standard)
- Programmable flat orient (27.5 deg default)
- Wafer rotation
- Programmable auto tilt, 0 to 89 degrees
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Contents
Configuration
- Year of Installation: 1996
- 200MM Batch
- 9 Site Disk
- 180 Wafers per Hour
- 40 Kev to 3 Mev Energy Range
- EBARA 40X20 Backing Pumps
- Seiko-Seiki STP-H2000C and Varian XXX Turbo Pumps
- CTI Cryo pumps
- Up to 35 Degree Implant Angle
- Touch Screen User Interface
- (1) Triple Charge Implant
- 1 Million Volts
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Note: All Products: Subject to availability at time and date of inquiry.
Contents
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OLM Enterprises
Tel: (408)259-1900 Fax: (408)259-1990
Toll Free Tel/Fax: 1-888-925-8293
E-mail: info@semiconweb.net
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