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Used Semiconductor Equipment, Vacuum Systems, Pumps, Etc: fl01

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Surplus Semiconductor Equipment: Novellus Concept One, Lam 4520i, Varian 3290, Applied Materials Centura HP PVD, Sputtered Films Inc 8600, Axcelis-Eaton GSD-200E & GSD-200EE, Etc.

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Novellus Concept One, Lam 4520i, KLA-Tencor Surfscan SP1, Axcelis-Eaton Ion Implanters GSD-200E and GSD-200EE, Varian 3190 Configurations and Equipment List

Please click on the links below to explore Systems configurations and other equipment for sale.


To see photos or pictures of other equipment and parts, please click here.


Contents


GSD200E Upgraded to GSD200EE

Details and Configuration

  • End station Generic Extended Yscan GSD200
  • 4 Light Tower w/ Flasher
  • Obs E63332 Rpl By 10011280 Spc Option w/o 8mm Tape
  • Standard White Inner Enclosure
  • Hyt 20sx 200mm Wide Access
  • English Domestic, Asia Pacific Labels
  • Cga 330 1/4" M Vcr W/M Nut
  • Cga 580 1/4" M Vcr W/M Nut
  • Auxiliary Gas Bottle
  • Cassette Guide Flurouware Ka200-80mhr
  • GSD200E Unique Assy's 80kv
  • 50 ft Remote On Board w/ Fast Regen
  • Retrofit Rotary Drive (Direct)
  • Retrofit Transformer Thermal Warning
  • 200mm Load Buffer for Bar Code
  • 3 Bot Sds Modular
  • Plasma Shwr Gsd-200e 80kv/160kv W 2000 Hr Cons
  • Argon Purge Mod Gas Box (W/4x)
  • Rga Kf-40 No Valve P9 Blankoff
  • Ina 15357 Field Rpl Only (Sys Cons 200hr (Mo)
  • P2 & P3 Relief Valve Exhaust SS Lines
  • Dis 63926 Fro Exhaust Switching
  • End Station Flow Monitor
  • Dis 58900 Fro Sprs Strk Plt Disk Fara (1199240)

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


KLA-Tencor Surfscan SP1
Non-Patterned Wafer Particle Measurement System

Details

  • ID: ER1483
  • Serial Number: 0697-130
  • Configurable for 150mm-200mm Wafer Sizes
  • Original Manufacture Date: June 1997
  • Model Number: 378534
  • System is in excellent condition and has seen little use
  • Normal Illumination - Defect Sensitivity: 0.079um
  • Haze Sensitivity: 0.005PPM
  • Argon Ion Laser (488-nm)
  • Equipe Robot: ESC 200
  • RTDC (Real TimeDefect Classification)
  • V 208, A 30, Ph 1, HZ 60

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


Film Thickness Mapping System, Prometrix FT-650

Details
  • ID: ER266
  • Serial Number: 9008F2U
  • Measures Single or Multiple Layers of Oxide, Nitride, Photo Resist, Poly Silicon and other Transparent Films from <100A to >4um
  • Patterned Recognition Capability for Fully Automatic Operation
  • Removed from Service April 2001
  • Currently stored in Clean Show Room
  • Power Requirements: 115 VAC, 500 Watts, 50/60 Hz
  • Configured for 150mm Wafers
  • Olympus Objectives
    • MS PLAN 2.5X/0.07
    • MS PLAN 5X/0.13
    • MS PLAN 10X/0.30
    • MS PLAN 20X/0.46
    • MS PLAN 50X/0.55
  • Cognex Vision System
    • 3100 Controller
    • Video Switch
  • C2CFT Wafer Loa
  • Cable Interface w/ Cables
  • AST Premium 386/25
  • Dimensions: 36"D x 62"W x 62"H
  • Weight: 700 lbs

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


Oxide Etcher, Lam 4520i, 6 Inch or 150MM

Details
  • ID: ER1450
  • Serial Number: 2653
  • Configured for 150mm Wafers
  • Through-the-Wall Configuration
  • Isotropic Etch Module
  • Hine 38A Indexers
  • Top Actuated Bottom Clamp
  • High Conductance Manifold
  • Erotherm Temperature Controller
  • Low Frequency Auto tuning (LoFat)
  • Remote RF Cart
    • ENI OEM LPG 12A RF Generator
    • ENI OEM 12XLA RF Generator
  • 3 Verity EP 200MMD Monochromator
  • Backside Helium Cooling
  • Lam Dual Channel Chiller
  • Orbitally Welded Gas Box
    • Unit 1660 MFC CF4 200 Sccm
    • Unit 1200A MFC O2 30 Sccm
    • Unit 1200A MFC SF6 100 Sccm
    • Unit 1200A MFC Ar 1000 Sccm
    • Unit 1200A MFC CHF3 50 Sccm
    • Unit 1200A MFC N2 100 Sccm
    • Unit 1200A MFC NF3 1000 Sccm
    • Unit 1200A MFC He 500 Sccm
  • Remote AC Box

If interested,   please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


Novellus Sputter Deposition, Model 3290-STQ

Details and Configuration:

    Quantity: 2
    Excellent Condition
    Serial No. LVE80511, Date Installed: June, 2000
    Serial No. LVE80512, Date Installed: June, 2000

    • Model 3290-STQ Fully automatic, cassette-to-cassette wafer loading and unloading:

    • Quantum Sputter Deposition Sources for each Deposition Station including:
      • 1. (1) Quantum Sputtering Source
      • 2. (1) CMD GEN 2.5-12KW-DC power supply per source including:
        • a. Remote digital power supply readout meters
        • b. Conveniently installed in system control electronics rack
        • c. One set of 50 ft. cables for each Quantum Source

    • 586 System Controller Including:
      • 1. 14" VGA colog touch screen via surface acoustic technology
      • 2. 238 Meg Hard Drive
      • 3. Interface Keyboard, Track Ball
      • 4. Printer Port
      • 5. Graphic User Interface
      • 6. Recipe Controlled Heaters
      • 7. Cryo Pump Quick Regeration Capability
      • 8. On-screen Data Collection and History Log
      • 9. User definable system access levels and access codes
      • 10. Diagnostic routines for maintenance and troubleshooting
      • 11. Programmable cool-time prior to wafer unload

    • CTI Onboard Cryo Pump with Fast Regeneration capability
    • Dedicated Load Lock Turbo Pump
    • (2) Edwards ESDP 30 Mechanical Roughing Pumps
    • Proximity Switches for Load Lock and Sealed Doors
    • Particle Reduction Kit
    • Electropolished Argon Develivery System
    • Argon Line Isolation Valve
    • AC Power Line Filter
    • 15 Minute UPS
    • (2) Sets of Quick Change Shields
    • Quantum Targets
    • RF Etch with Preheat at Station 1
    • CTI Water Pump
    • VIP at Station 1

If interested, please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


Applied Materials Centura HP PVD

Details and Configuration:

    Quantity: 1
    Escellent Condition
    Serial No. T-27094-33-2519, (System 2519)
    Date Installed: May 2001

    Applied Materials Cuntura HP PVD, 6", mainframe with:
    • One ultra-high vacuum Centura HP PVD platform featuring the HP dual high speed wafer transfer robotics, dual load lock chambers, a Fast Regen Cryo pump, and wafer mapping cassette capability.

    • The Centura HP PVD control system features a 32-bit microprocessor control, CRT display with light pen. Software capability includes sophisticated recipe programming, process parameter and wafer history storage, self diagnostics, automated service routines, and host computer interface via an RS232 port.

    Chambers A, B, & D - Aluminum PVD (Aluminum Dura Source Process)
    • PVD Chamber Opt.: Std. PVD Chamber
    • PVD UHV Pump Opt.: CTI Fast Regen Low Vibration
    • PVD Power Supply Opt.: High Accuracy Low Output (HALO)
    • PVD Wafer Chuck Opt.: Mechanically Clamped Heaters
    • Mechanical Clamped: Clamped "Original" Heater
    • Clamp Ring Opt.: SST ARC Sprayed Clamp Rings
    • Shield Opt.: SST One Piece Arc Sprayed
    • PVD Pressure Control:
      • Gate Valve: 2-Position Gate Valve
      • Cryo Restrictors: Standard Cryo Restrictor

    Chamber C - Aluminum PVD (Aluminum Dura Source Process)
    • Same as above except:
      • Clamp Ring Opt.: Ti Arc Sprayed Clamp Ring

    Chamber F - Auxiliary Chamber
    • Orienter Chamber Opt.: Orienter with Std. Degas

If interested, please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


Sputtered Films, Inc. Model 8600

Details and Configuration:

    Quantity: 2
    Escellent Condition
    Serial No. 19347
    Date Installed: January, 1997

    System No. 1:

    • Software rev. 2.0
    • Backing pumps for all modules are Vacuubrand MD-4l
    • TM uses CTI 8510 Cryo compressor

    • PM1 and PM3
      • Sputter module
      • Series 4.2 Gun
      • UPS
      • Omega CN3000 Controller
      • AE RFX-600 RF Generator
      • AE ATX-600 RF Tuner
      • AE MDX-1.5K Magnetron Drive
      • AE MDX-1.5K Magnetron Drive
      • HP 6012B DC Power Supply
      • Pfeiffer TPH180HU Turbo

    • PM2 and PM4
      • Sputter module
      • Series 4.2 Gun
      • UPS
      • AE RFX-600 RF Generator
      • AE ATX-600 RF Tuner
      • AE MDX Pinnacle 6
      • AD MDX Pinnacle 6
      • HP 6012B DC Power Supply
      • Inficon Transpector RGA Head
      • Pfeiffer TPH180HU Turbo

    • PM5
      • Degas, RF etch module
      • Series 3 Gun
      • UPS
      • AE RFX-600 RF Generator
      • AE ATX-600 RF Tuner
      • AE MDX Pinnacle 6
      • HP 6012B DC Power Supply
      • Inficon Transpector RGA Head
      • Pfeiffer TPH180HU Turbo

    • CM
      • Cassette module
      • Omega CN132 Controller
      • UPS
      • Pfeiffer TPH180HU Turbo

    • TM
      • Transfer module
      • Inficon Transpector RGA Head
      • CTI-Cryogenics water pump
      • Pfeiffer TPH180HU Turbo

    System No. 2:

    • Software rev. 2.0
    • Backing pumps for all modules are Vacuubrand MD-4l
    • TM and PM3 share a CTI 9600 Cryo compressor

    • PM1
      • Degas, RF etch module
      • Series 3 Gun
      • UPS
      • AE RFX-600 RF Generator
      • AE ATX-600 RF Tuner
      • AE MDX Pinnacle 6
      • HP 6012B DC Power Supply
      • Pfeiffer TPH180HU Turbo

    • PM2
      • Sputter module
      • Series 4.2 Gun
      • UPS
      • Omega CN3000 Controller
      • AE RFX-600 RF Generator
      • AE ATX-600 RF Tuner
      • AE PE-10K AC Plasma Source
      • AE PE Power Pack
      • Pfeiffer TPH180HU Turbo

    • PM3
      • Sputter module
      • Series 4 Gun
      • UPS
      • CTI Cryogenics Water Pump
      • Omega CN3000 Controller
      • AE RFX-600 RF Generator
      • AE ATX-600 RF Tuner
      • AE MDX-L12M
      • AE MDX-L12M
      • HP 6012B DC Power Supply
      • Inficon Transpector RGA Head
      • Pfeiffer TPH180HU Turbo

    • PM4
      • Sputter module
      • Series 4.2 Gun
      • UPS
      • Omega CN3000 Controller
      • AE MDX Pinnacle 6
      • AD MDX Pinnacle 6
      • Pfeiffer TPH180HU Turbo

    • PM5
      • Sputter module
      • Series 4.2 Gun
      • UPS
      • RGA Computer
      • AE MDX Pinnacle 6
      • AD MDX Pinnacle 6
      • Pfeiffer TPH180HU Turbo

    • CM
      • Cassette module
      • Omega CN132 Controller
      • UPS
      • Pfeiffer TPH180HU Turbo

    • TM
      • Transfer module
      • Inficon Transpector RGA Head
      • CTI-Cryogenics Water Pump
      • Pfeiffer TPH180HU Turbo

If interested, please click here.

Note: All equipment are subject to availability at time and date of inquiry

Contents


Used, Surplus, or Pre-owned Semiconductor Equipment for Sale

Please call or send inquiry to   info@semiconweb.net.

If interested in one or more items, you may also   click here.

Note: All products are subject to availability at time and date of inquiry.

Note 2: All Applied Materials, P-5000's are 8 inch systems.

Item SRMM ID Code Manufacturer Model S/N Description Wafer Size, mm Configurations/Comments
1 SR-8005T Applied Material P5000 7052 Mark II MxP Etcher, Poly, 3 chamber 200 Mainframe 5000 MxP-OIE, 3 chambers: A-Polysilicon MxP2000A, B-Dielectric P1000B, C-Polysilicon MxP 2000C, Cassette Loader, Gas Panel, 5000 Standard Interface, Edwards Pumps, RF, (NF3, Ar, CF4, N2, Hydrogen Bromide Chloride).
2 SR-8010T Applied Material P5000 7019 Mark II MxP Etcher, Dielectric, 4 chamber 200 Mainframe 5000, MxP-OIE, 4 chamber A-D Dielectric Etch MxP 2000A, 1000B, 1000C, 1000D (4 Etch Chambers) w/ Leybold Wet Pump, Gas Panel, Cassette Loader, RF, (He, Freon, N2, O2/He, Ar, Ethylene Glycol).
3 SR-8006T Applied Material P5000 7035 Mark II MxP Etcher, 3 chamber 200 Mainframe 5000 MxP-OIE, 3 chambers: A-Dielectric MxP 1000, B-MxP 1000B, C-MxP 1000C, Includes Gas Panel, 5000 Standard Interface, Edwards Pumps, RF, (O2, Ar, He, H2).
4 SR-8008T Applied Material P5000 4503 Mark II MxP Etcher, Poly, 4 chamber 200 Mainframe, Taper via Etch Tool, 4 Chambers: A-D Dielectric Etch MxP 1000A, B, C, & D, Gas Panel (4 Etch Chambers) w/ Transfer Chamber, RF, (Ar, He, NF3, N2, Freon).
5 SR-8009T Applied Material P5000 7039 Mark II MxP Etcher, Metal, 4 chamber 200 4 Chambers: A-D w/ Gas Panel (4 Etch w/ Transfer Chamber), RF, (N2, Ethylene Glycol, He, Freon, O2, Argon, Carbon Tetraflouride).
6 SR-8007T Applied Material P5000 6911 Mark II MxP Etcher, 2 chamber 200 500 MxP-OIE, A: Polysilicon MxP 2000A, Chamber B: Dielectric MxP 1000B w/ Gas Panel, Cassette Loader, RF, (O2, He, CL, Nitrogen Triflouride, Hydrogen Bromide, HBr, He, Freon, Argon, N2).
7 SR-8011T Applied Material P5000 7038 Mark II MxP Etcher, 4 chamber 200 System 5000 MxP, w/ Mainframe 5000, MxP-OIE, Chamber A-D Dielectric Etch MxP 2000A, 1000B, 1000C, 1000D (4 Poly Etch Chambers) w/ Leybold Pump, Gas Panel, RF, (NF3, N Bromide, Cl, B, Ethylene Glycol, He, O2, Freon, SF6)
8 SR-8001T Atomika Inst SIMS   SIMS N/App. 3 Ion Guns: Cs, O2, Ga
9 SR-8002T Atomika Inst TXRF 8030W   TXRF 125-200 Optional Iwatani Liquid Nitrogen Generator
10 SR-10056T Advantest T3323   N/A 125-200  
11 SR-10041T Delta Design 9023 23   53   4 Temperature Chamber N/A Includes cooling hoses & manual
12 SR-10046T DNS WS620C Spin Module New Module for WS620C 150 New, Never Installed


Used Kokusai Vertical Furnace System

Item Equipment/Description Model/Serial No. Manufacturer Comments
1 Kokusai Vertical Furnace System, 8 Inch Vertron DJ-803V Kokusai Used for Nitride, Poly, and Teos processes. One large crate of spare parts is available. To be sold "As-Is", "Where-Is".

Submit reasonable offers for immediate consideration.

Please click on the stamp images below to see photos:

Nitride Front Photo Poly Front Photo Teos Front Photo Wafer Handler Photo

If interested, please click here.

Note: All Products: Subject to availability at time and date of inquiry.

Contents


Surplus Semiconductor Equipment

Surplus or Excess Semiconductor Equipment