Rebuilt, Refurbished, or Used Semiconductor Equipment, Novellus Parts, Polishing Wheels, Etc.
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The following equipment can be ordered with a lead time of 3-4 weeks upon receipt of order. All equipment are subject to availability at time and date of inquiry. Please click here to request for details.
Equipment List
- Applied Materials, P5000, 3 chamber CVD, with pumps
- Applied Materials, P5000, 2 chamber Etch with pumps
- Applied Materials, 83xx Etch system with pumps
- LAM, 490, 590 etch system with pumps
- LAM, 44xx, 45xx etch system with pumps
- Gasonics, Aura 1000 with pump
- Gasonics, AE2001 with pump
- Gasonics, L3510 with pump
Vacuum pumps are rebuilt Edwards QDP80/250 or QDP80.
Contents
Guaranteed to meet or exceed AMAT P5000 Specifications
System Configuration
- P5000 Mark II mainframe
- Configured for 150mm (6") wafers, SMF
- Standard remote frame
- 380VAC/50Hz/3 phase
- Expanded gas panel with mini-controller
- Phase III robot I/O wafer sensor
- 8 slot storage elevator
- Bolt down loadlock with particle reduction kit
- 21 slot VME with 3 1/2" FDD
- Hardware Y2K compliant
- VGA monitor/light pens through the wall
- Stand Alone Remote Monitor
- Three (3) PECVD standard chamber
- One (1) AMAT heat exchanger
- Three (3) ENI-12B RF generators
- Phase IV RF Match
- Unit 1660 MFC's
- Dual spring type throttle valve
- Edwards pump interface
- Pump(s) quoted separately
- Installation quoted separately
Chambers
- Chamber A: PECVD standard chamber, process Kit, 150mm
- Chamber B: PECVD standard chamber, process Kit, 150mm
- Chamber C: Blank
- Chamber D: PECVD standard chamber, process Kit, 150mm
Note: chambers can be configured differently per buyer's request.
PETEOS Chambers (A,B,D)
- Standard universal chambers
- 150mm process kit (100% New)
- ENI OEM 12B RF Generator with Phase IV match
- Standard throttle valve
- 100 Torr manometer
- Up to 4 Unit 1660 MFC's per chamber
- Gas panel rebuilt with New lines and re-calibrated MFC's, it looks NEW
If interested, please click here.
Note: Subject to availability at time and date of inquiry.
Contents
Guaranteed to meet or exceed AMAT P5000 Specifications
System Configuration
- P5000 Mark II mainframe
- Configured for 150mm (6") wafers, SMF
- Standard remote frame
- 380VAC/50Hz/3 phase
- Expanded gas panel with mini-controller
- Phase III robot I/O wafer sensor
- 8 slot storage elevator
- Bolt down loadlock with particle reduction kit
- 21 slot VME with 3 1/2" FDD
- Hardware Y2K compliant
- VGA monitor/light pens through the wall
- Stand Alone Remote Monitor
- Three (3) universal PETEOS chambers
- One (1) AMAT heat exchanger
- Three (3) ENI-12B RF generators
- Phase IV RF Match
- Unit 1660 MFC's
- Dual spring type throttle valve
- Edwards pump interface
- Hot Box IV
- Schumacher TEOS Delivery Cabinet (canisters not included)
- Pump(s) quoted separately
- Installation quoted separately
Chambers
- Chamber A: PETEOS/USG chamber, process Kit, 150mm
- Chamber B: PETEOS/USG chamber, process Kit, 150mm
- Chamber C: Blank
- Chamber D: PETEOS/USG chamber, process Kit, 150mm
Note: chambers can be configured differently per buyer's request.
PETEOS Chambers (A,B,D)
- Standard Universal PETEOS chambers
- 150mm process kit (100% New)
- ENI OEM 12B RF Generator with Phase IV match
- Standard throttle valve
- 100 Torr manometer
- Up to 4 Unit 1660 MFC's per chamber
- Gas panel rebuilt with New lines and re-calibrated MFC's, it looks NEW
If interested, please click here.
Note: Subject to availability at time and date of inquiry.
Contents
Guaranteed To Meet OEM Specifications
Basic Configuration:
- Anodized Al chamber with quarts chamber window
- Pic & place robot wafer handling
- Load/unload cassette elevator
- End point detection
- Microprocessor interface pressure control
- Magnetron power supply
- Lamp alarm board
- Lamps and Quartz installed
- Throttle valve included
- Export packaging included
- Edwards QDP80/250 pump/blower set included
If interested, please click here.
Note: Subject to availability at time and date of inquiry.
Contents
| Item
| Part No.
| Description
| Qty
| Unit Price
|
| 1
| 16-033931-00
| 200mm Showerhead
| 6
| $985.00
|
| 2
| 16-033932-00
| 150mm Showerhead
| 8
| $925.00
|
| 3
| 02-0093-00
| One Arm Robot
| 1
| $17,500.00
|
| 3A
| 02-0093-00
| One Arm Robot
| 1
| $15,00.00 (With Exchange)
|
| 4
| 15-00701-00
| Bottom Fork Plate, 150mm
| 1
| $1,100.00
|
| 5
| 15-00703-00
| Top Fork Plate, 150mm
| 1
| $985.00
|
| 6
| 02-029514-01
| Left Indexer Assy. (OEM)
| 1
| $18,500.00
|
| 7
| 02-029514-02
| Right Indexer Assy. (OEM)
| 1
| $18,500.00
|
If interested, please click here.
Note: All items are subject to availability at time and date of inquiry.
Contents
Semiconductor or Wafer Fab Equipment for Five Inch Wafers
Note 1: Original configuration is for 5 inch wafer. Some are convertible to 6 inches/other sizes.
Note 2: All equipment are store in clean/humidity-temperature controlled room.
| Item #
| Ref #
| Equipment Name
| Manufacturer
| Model
| Size
| Original Acquisition Date
|
| 1
| S01
| G-Line Stepper
| Nikon
| NSR1505G3A
| |
8803
|
| 2
| S02
| G-Line Stepper
| Nikon
| NSR1505G3A
| |
8808
|
| 3
| S03
| G-Line Stepper
| Nikon
| NSR1505G4BK
| |
9303
|
| 4
| S04
| G-Line Stepper
| Nikon
| NSR1505G4D
| |
8802
|
| 5
| S05
| G-Line Stepper
| Nikon
| NSR1505G4D
| |
9509
|
| 6
| S06
| G-Line Stepper
| Nikon
| NSR1505G6E
| 5,6 |
9809
|
| 7
| S07
| G-Line Stepper
| Nikon
| NSR1505G6E
| 5,6 |
9109
|
| 8
| S08
| G-Line Stepper
| Nikon
| NSR1505G7E
| |
9009
|
| 9
| S09
| I-B38Line Stepper
| Nikon
| NSR1505i7A
| 5,6
| 0103
|
| 10
| S10
| Resist Coater and Developer
| DNS
| SKW-636BVP
| 5,6
| 9903
|
| 11
| S11
| Deep UV Curing System
| Ushio Electric
| UMA-802-H6
| |
8802
|
| 12
| S12
| Deep UV Curing System
| Ushio Electric
| UMA-802-HC57MS
| 5,6
| 9201
|
| 13
| S13
| Character Exposure System
| Canon
| AIM-630
| 5,6
| 8708
|
| 14
| S14
| Lamp Annealing System
| DNS
| LAW-6L3-A
| |
8801
|
| 15
| S15
| Lamp Annealing System
| DNS
| LAW-815
| 5,3
| 9503
|
| 16
| S16
| Dry Etcher
| Tokya Ohka
| OAPM-301B
| |
8603
|
| 17
| S17
| Dry Etcher
| Tokya Ohka
| TCE-2600
| |
9104
|
| 18
| S18
| Dry Etcher
| Tokya Ohka
| OPM-A1250
| |
8802
|
| 19
| S19
| Dry Etcher
| Tokya Ohka
| OPM-A1200
| |
8409
|
| 20
| S20
| Dry Etcher
| Tokya Ohka
| OAPM-A1200
| |
8703
|
| 21
| S21
| Dry Etcher
| Alcantec
| MAS-801
| 5,6
| 9610
|
| 22
| S22
| Dry Etcher
| Alcantec
| MAS801-HR
| |
0102
|
| 23
| S23
| Dry Etcher (Polysilicon)
| Hitachi
| M216A-2
| 5,6
| 9703
|
| 24
| S24
| Dry Etcher (Polysilicon)
| Tokyo Ohka
| OAPM-406
| |
9409
|
| 25
| S25
| Dry Etcher (Polysilicon)
| Hitachi
| M216A-2
| |
9703
|
| 26
| S26
| Dry Etcher (Oxide)
| TEL
| TE-5000
| 5,6
| 9703
|
| 27
| S27
| Dry Etcher (Oxide)
| TEL
| TE-4000
| |
9703
|
| 28
| S28
| Dry Etcher (Oxide)
| TEL
| TE-8400S
| |
9703
|
| 29
| S29
| Dry Etcher (Oxide)
| TEL
| TE-8400PE
| |
9701
|
| 30
| S30
| Dry Etcher (Oxide)
| Tokyo Ohka
| OAPM-301B
| |
8509
|
| 31
| S31
| Dry Etcher (Oxide)
| Anelva
| ILD-4003
| |
8509
|
| 32
| S32
| Dry Etcher (Oxide)
| Anelva
| ILD-4013T
| |
9503
|
| 33
| S33
| Dry Etcher (Metal)
| Hitachi
| M308AT
| |
9011
|
| 34
| S34
| Plasma Etcher
| Tokyo Ohka
| OPM-A1200
| |
8503
|
| 35
| S35
| Wafer Scrubber
| DNS
| SSW-636
| |
9104
|
| 36
| S36
| Wafer Scrubber
| DNS
| SSW-627
| |
9003
|
| 37
| S37
| Wafer Scrubber
| DNS
| SSW-629-B
| |
9501
|
| 38
| S38
| Wafer Scrubber
| DNS
| SSW-636-B
| 3,4,5,6
| 8902
|
| 39
| S39
| Implanter (Medium Current)
| Nisshin Electric
| NH-20S
| 5,6
| 9203
|
| 40
| S40
| Implanter (Medium Current)
| Nisshin Electric
| SPCV1850U116-FL
| |
9508
|
| 41
| S41
| Implanter (High Current)
| TEL/VARIAN
| 80/10
| |
9502
|
| 42
| S42
| Implanter (High Current)
| AMAT
| PI9500
| |
9506
|
| 43
| S43
| Implanter (High Current)
| Nisshin Electric
| NH-40SR
| |
9309
|
| 44
| S44
| APCVD
| AMJ
| AMS-2100
| 5,6
| 8709
|
| 45
| S45
| APCVD
| AMAYA
| AEC-2260
| 5,6
| 9505
|
| 46
| S46
| PECVD
| ASM
| EECVD
| |
8802
|
| 47
| S47
| Sputtering System, Aluminum
| TEL/VARIAN
| VARIAN-3180
| |
9003
|
| 48
| S48
| Sputtering System, Aluminum
| TEL/VARIAN
| VARIAN-3180
| |
9403
|
| 49
| S49
| Sputtering System, Aluminum
| Tokuda MFG
| CCS-1400
| |
8909
|
| 50
| S50
| Diffusion Furnace, Horizontal
| TEL
| DL-8P-473-SDDC
| |
9304
|
| 51
| S51
| Diffusion Furnace, Horizontal
| TEL
| DL-8P-473LT-SDDC
| |
9503
|
| 52
| S52
| Mask Aligner
| Canon
| PLA-501FA
| |
8709
|
| 53
| S53
| Coater Developer
| DNS
| SKW-636-BV
| 5,6
| 9309
|
| 54
| S54
| Coater Developer (Polyimide)
| DNS
| SCW-524-BVQ
| 3,4,5,6
| 8603
|
| 55
| S55
| Developer (Polyimide)
| DNS
| DVW-423A
| |
8703
|
| 56
| S56
| Curing Oven
| Oshitari
| SCOX-1300-H
| |
8603
|
| Item #
| Ref #
| Equipment Name
| Manufacturer
| Model
| Size
| Original Acquisition Date
|
| 1
| K69
| Inspection Station
| Canon
| VIR-600
| 5,6
| 8703
|
| 2
| K70
| Wafer Particle Monitor System
| Hitachi Deco
| IS-1010
| |
8909
|
| 3
| K71
| Wafer Particle Monitor System
| Topcon
| WM-3
| |
8909
|
| 4
| K72
| Pattern Defect Review System
| KLA-TENCOR
| KLA2111
| |
0103
|
| 5
| K73
| Pattern Defect Review System
| KLA-TENCOR
| KLA2131E
| |
9610
|
| 6
| K74
| Overlay Measurement System
| KLA-TENCOR
| KLA5010
| |
0109
|
| 7
| K75
| Al Film Thickness Measurement System
| KLA-TENCOR
| M-GAGE20
| |
8509
|
| 8
| K76
| Al Film Thickness Measurement System
| KLA-TENCOR
| M-GAGE300
| |
9201
|
| 9
| K77
| 4 Point Probe
| Kokusai Electric
| VR-30A
| |
8602
|
| 10
| K78
| Ellipsometer
| Rudolph Research
| 2C.4C
| |
8601
|
| 11
| K79
| Ellipsometer
| Rudolph Research
| AUTO.EL
| 4,5,6
| 8509
|
| 12
| K80
| Ellipsometer
| Rudolph Research
| SS1,4D
| |
8703
|
| 13
| K81
| Film Thickness Measurement System
| NANOMETRICS
| NANOSPECT/AFT
| |
9509
|
| 14
| K82
| Film Thickness Measurement System
| NANOMETRICS
| NANOSPECT/AFT
| |
8603
|
| 15
| K83
| X-ray Analysis System
| TECHNOS
| TREX610
| |
9309
|
| 16
| K84
| FTIR System
| Nicolet Instruments
| ECO-8S
| |
8801
|
| 17
| K85
| CD SEM
| Hitachi
| S-6000
| 5,6
| 8808
|
| 18
| K86
| CD SEM
| Hitachi
| S-7000
| |
9009
|
| 19
| K87
| CD SEM
| Hitachi
| S-7080
| |
9303
|
| 20
| K88
| CD SEM
| Hitachi
| S-6200H
| |
9506
|
| 21
| K89
| CD Measurement System
| Nikon
| LAMPAS-M3
| 3,4,5,6
| 8603
|
| 22
| K90
| CD Measurement System
| Nikon
| LAMPAS-HD
| 3,4,5,6
| 9203
|
| 23
| K91
| Inspection Station
| Canon
| VIR-600
| 5,6
| 8603
|
| 24
| K92
| Parametric Test System
| Keithley
| S350
| |
8503
|
| 25
| K93
| Wafer Particle Monitor System
| Hitachi
| HILIS-200
| 4,5,6
| 8703
|
If interested in one or more items, please click here.
Rotary Polishing Wheel
Please click on the image below for enlarged photo
Mounted Felt Polishing Wheel
- 3M Satin Finishing Material
- Stainless steel material for 3/32” shank and related parts
- Specifications:
- 7/8 X 3/8 X 3/32
- 7/8 X ¼ X 3/32
Minimum volume required to order this product. Packed or unpacked. Packing may be specified by buyer.
If interested please click here.
If interested in one or more items, please click here.
If you need Mass Flow Controllers, please click here.
If you need Vacuum Pumps, please click here.
Please contact us at:
OLM Enterprises
Tel: (408)259-1900 Fax: (408)259-1990
Toll Free Tel/Fax: 1-888-925-8293
E-mail: info@semiconweb.net
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OLM Enterprises Semiconductor Equipment Resource Center
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